Ion Implantation and Annealing Applications, Science and Technology by Current, Michael (9783032100078) | Browns Books
Image for Ion Implantation and Annealing Applications, Science and Technology

Ion Implantation and Annealing Applications, Science and Technology : Contributions from IIT School, Edition 2024

Current, Michael(Edited by)Lerch, Wilfried(Edited by)
Part of the Topics in applied physics series
See all formats and editions

This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing.

It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology.

This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.

Read More
Special order line: only available to educational & business accounts. Sign In
£199.99
Product Details
3032100070 / 9783032100078
Hardback
14/06/2026
Switzerland
8 pages, 14 Illustrations, color; 410 Illustrations, black and white
155 x 235 mm

We have stock available for immediate despatch, and should this not cover your order, if more stock isn’t already on the way, it will be ordered immediately to cover your order.

This typically takes 1-2 weeks, depending on availability from the publisher.