Image for Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices - 1999: Volume 557

Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices - 1999: Volume 557

Branz, Howard M.(Edited by)Collins, Robert W.(Edited by)Guha, Subhendu(Edited by)Okamoto, Hiroaki(Edited by)Schropp, Ruud E. I.(Edited by)
Part of the MRS Proceedings series
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Applications requiring large-area semiconductor coverage rely increasingly on amorphous and heterogeneous silicon materials because they can be deposited at low cost on a variety of substrates.

This volume, first published in 1999, covers the range from fundamental research to the device applications of these materials.

A special session on medium-range order is featured, and confirms the belief that ordering correlates with the electronic quality of a-Si:H films.

Important experimental observations on metastable effects in a-Si:H are also reported, as are devices and processing strategies.

Topics include: growth and properties; high-rate deposition; recrystallization, amorphization and porous silicon; ordering and hydrogen; metastability; defects, band tails and transport; heterogeneous materials and devices; thin-film transistors and displays; solar cells; and detectors, imagers and other devices.

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Product Details
Cambridge University Press
1107413931 / 9781107413931
Paperback
05/06/2014
United Kingdom
912 pages, black & white illustrations
152 x 229 mm, 1200 grams
Professional & Vocational Learn More