Image for Photomask and Next-generation Lithography Mask Technology XIII

Photomask and Next-generation Lithography Mask Technology XIII

Part of the Proceedings of SPIE series
See all formats and editions

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics.

These books provide prompt access to the latest innovations in research and technology in their respective fields.

Proceedings of SPIE are among the most cited references in patent literature.

Read More
Special order line: only available to educational & business accounts. Sign In
£110.00
Product Details
SPIE Press
0819463582 / 9780819463586
Paperback / softback
30/07/2006
United States
Illustrations (some col.)
Professional & Vocational Learn More